There are sapphire wafers and substrates of various specifications in different crystal directions, thicknesses, processing accuracy requirements. Mainly sapphire wafer products are 2'', 4'' and 6'' sapphire wafers. Customization is available.
Applications including but not limited to:
Microelectronic IC applications
SOS Silicon-on-Sapphire
The growth of superconducting compounds / Gallium Nitride
Infrared detectors
Hybrid microelectronics
Polishing carriers
Hostile environment
Optical transmission from ultraviolet to near infrared
High temperature
Radiation resistance
Specification
Crystal Material | ≥ 99.995% Al2O3, High Purity |
Diameter | Ø2" 50.8mm, Ø 3" 76.2mm, Ø 4" 100mm, Ø 6" 150mm etc |
Thickness | 430um (Ø 2"), 430/600um (Ø 3"), 650/600 um (Ø 4"), 1000/1300um (Ø 6"),or other customized thickness available |
Surface finish | One side polished (SSP), Double sided polished (DSP) |
Surface Roughness | Epi-ready CMP Ra ≤ 0.3nm (polished side) |
TTV/WARP/BOW | ≤10um/ 10um/ 10um |
Packing | Class 100 Clean room cleaning and vacuum packaging |
